Publications: Advanced Coatings

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2018

Lee, Eleanor S."Innovative Glazing Materials."Handbook of Energy Efficiency in Buildings A Life Cycle Approach (2018).

2014

Anders, André, Pavel A Ni, and Joakim Andersson."Drifting Ionization Zone in DC Magnetron Sputtering Discharges at Very Low Currents."IEEE Transactions on Plasma Science 42.10 (2014) 2578 - 2579. DOI
Panjan, Matjaž, Robert Franz, and André Anders."Asymmetric particle fluxes from drifting ionization zones in sputtering magnetrons."Plasma Sources Science and Technology 23.2 (2014) 025007. DOI

2013

Anders, André, Matjaž Panjan, Robert Franz, Joakim Andersson, and Pavel A Ni."Drifting potential humps in ionization zones: The “propeller blades” of high power impulse magnetron sputtering."Applied Physics Letters 103.14 (2013) 144103. DOI
Andersson, Joakim, Pavel A Ni, and André Anders."Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas."Applied Physics Letters 103.5 (2013) 054104. DOI
Lim, Sunnie H.N, Jan Isidorsson, Lizhong Sun, B. B Leo Kwak, and André Anders."Modeling of optical and energy performance of tungsten-oxide-based electrochromic windows including their intermediate states."Solar Energy Materials and Solar Cells 108 (2013) 129 - 135. DOI

2012

Anders, André, Pavel A Ni, and Albert Rauch."Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering."Journal of Applied Physics 111.5 (2012) 053304. DOI
Zhu, Yuankun, Rueben J Mendelsberg, Sunnie H.N Lim, Jiaqi Zhu, Jiecai Han, and André Anders."Improved structural and electrical properties of thin ZnO:Al films by dc filtered cathodic arc deposition."Journal of Materials Research 27.05 (2012) 857 - 862. DOI
Anders, André, Jiří Čapek, Matêj Hála, and Ludvik Martinu."The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering."Journal of Physics D: Applied Physics 45.1 (2012) 012003. DOI

2011

Anders, André, and Jeff Brown."A Plasma Lens for Magnetron Sputtering."IEEE Transactions on Plasma Science 39.11 (2011) 2528 - 2529. DOI
Garcia, Guillermo, Raffaella Buonsanti, Evan L Runnerstrom, Rueben J Mendelsberg, Anna Llordes, André Anders, Thomas J Richardson, and Delia J Milliron."Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals."Nano Letters 11.10 (2011) 4415 - 4420. DOI
Mendelsberg, Rueben J, Sunnie H.N Lim, Yuankun Zhu, Joe Wallig, Delia J Milliron, and André Anders."Achieving high mobility ZnO:Al at very high growth rates by dc filtered cathodic arc deposition."Journal of Physics D: Applied Physics 44.23 (2011) 232003-232007. DOI

2010

Ni, Pavel A, and André Anders."Supersonic metal plasma impact on a surface: an optical investigation of the pre-surface region."Journal of Physics D: Applied Physics 43.13 (2010). DOI

2009

Anders, André, Sunnie H.N Lim, Kin Man Yu, Joakim Andersson, Johanna Rosén, Mike McFarland, and Jeff Brown."High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition."Thin Solid Films (2009).

2008

Endrino, Jose L, Jose F Marco, Phitsanu Poolcharuansin, Ayalasomayajula R Phani, Matthew Allen, José M Albella, and André Anders."Functionalization of Hydrogen-free Diamond-like Carbon Films using Open-air Dielectric Barrier Discharge Atmospheric Plasma Treatments."Applied Surface Science 254.17 (2008). DOI
Andersson, Joakim, Arutiun P Ehiasarian, and André Anders."Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma."Applied Physics Letters 93.7 (2008) 71504. DOI
Richardson, Thomas J."Phase transitions in non-hydride switchable mirror thin films."Phase Transitions 81.7-8 (2008) 807 - 813. DOI
Anders, André."Deposition Rates of High Power Impulse Magneton Sputtering."51st Annual Technical Meeting of the Society of Vacuum Coaters (2008).
Field, Matthew R, Dougal G McCulloch, Sunnie H.N Lim, André Anders, Vicki J Keast, and R.W Burgess."The structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering."Journal of Physics: Condensed Matter 20 (2008) 175216. DOI
Anders, André."Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions."Applied Physics Letters 92.20 (2008). DOI
Anders, André, Jonathan L Slack, and Thomas J Richardson."Electrochromically switched, gas-reservoir metal hydride devices with application to energy-efficient windows."Thin Solid Films 1 (2008).
Andersson, Joakim, and André Anders."Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion."Applied Physics Letters 92 (2008) 221503.
Andersson, Joakim, and André Anders."Self-sputtering far above the runaway threshold: an extraordinary metal ion generator."Physical Review Letters (2008).
Horwat, David, and André Anders."Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper."Journal of Physics D 41 (2008) 135210-1-6.

2007

Mohamed, Sodky H, and André Anders."Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering."Thin Solid Films 515.13 (2007) 5264-5269. DOI