Publications
] . "Effect of Deposition Pressure on the Microstructure and Electrochromic Properties of Electron-beam-evaporated Nickel Oxide Films." Thin Solid Films 221 (1992) 239-253. LBNL-39077. 
PDF (1.04 MB)
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PDF (1.04 MB). "Drifting Ionization Zone in DC Magnetron Sputtering Discharges at Very Low Currents." IEEE Transactions on Plasma Science 42.10 (2014) 2578 - 2579.
. "Physics of Arcing, and Implications to Sputter Deposition." International Conference on Coatings on Glass. Saarbrucken, Germany, 2003. LBNL-54220. PDF (224.27 KB)
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PDF (224.27 KB). The Periodic Table of Vacuum Arc Charge State Distributions. Berkeley, CA: Lawrence Berkeley National Laboratory, 1996. LBNL-38672. PDF (2.84 MB)
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PDF (2.84 MB). "Working Principle of the Hollow-Anode Plasma Source." Plasma Source Science and Technology 4.4 (1995) 571-575. LBL-36240. PDF (638.02 KB)
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PDF (638.02 KB). "High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition." Thin Solid Films (2009). LBNL-1881E. PDF (1.02 MB)
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PDF (1.02 MB). "Fundamentals of Pulsed Plasmas for Materials Processing." Surface and Coatings Technology 183 (2003) 301-311. LBNL-51683. PDF (775.85 KB)
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PDF (775.85 KB). "Energetic or Not Energetic: Considerations for Fabricating Nanostructures by Physical Vapor Deposition." NanoSingapore 2006: IEEE Conference on Emerging Technologies - Nanoelectrics, January 10-13. Singapore, 2005. LBNL-57734 Ext. Abs. PDF (111.63 KB)
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PDF (111.63 KB). "Drifting potential humps in ionization zones: The “propeller blades” of high power impulse magnetron sputtering." Applied Physics Letters 103.14 (2013) 144103.
. "Deposition Rates of High Power Impulse Magneton Sputtering." 51st Annual Technical Meeting of the Society of Vacuum Coaters. 2008. LBNL-170E. PDF (267.34 KB)
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PDF (267.34 KB). "Surface Engineering of Glazing Materials and Structures Using Plasma Processes." Glass Processing Days 2003 . Tampere, Finland, 2003. LBNL-52436. PDF (321.78 KB)
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PDF (321.78 KB). "Predicting Ion Charge State Distributions of Vacuum Arc Plasmas." 1996. LBL-37921. PDF (437.8 KB)
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PDF (437.8 KB). Materials, processes, and issues in low-emissivity and solar control coatings. 2002. LBID-2452. PDF (1.1 MB)
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PDF (1.1 MB). "Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective." 50th Technical Annual Meeting of the Society of Vacuum Coaters. 2007. LBNL-61903. PDF (1 MB)
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PDF (1 MB). "Plasma biasing to control the growth conditions of diamond-like carbon." Surface and Coatings Technology 201.8 (2006) 4628-4632. LBNL-59023. PDF (573.71 KB)
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PDF (573.71 KB). "Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering." Journal of Applied Physics 111.5 (2012) 053304.
. "Vacuum-Spark Metal Ion Source Based on a Modified Marx Generator." 1996. LBNL-37922. PDF (433.13 KB)
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PDF (433.13 KB). "Self-organization and self-limitation in high power impulse magnetron sputtering." Applied Physics Letters 100.22 (2012). LBNL-5685E. PDF (1.2 MB)
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PDF (1.2 MB). "A low-energy linear oxygen plasma source." Review of Scientific Instruments 78.4 (2007). LBNL-62169. PDF (4.61 MB)
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PDF (4.61 MB). "Physics of High Power Impulse Magnetron Sputtering." ISSP2007: The 9th International Symposium on Sputtering & Plasma Processes. 2007. LBNL-62147. PDF (411.54 KB)
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PDF (411.54 KB). "Observation of Self-Sputtering in Energetic Condensation of Metal Ions." Applied Physics Letters 85 (2004) 6137-6139. LBNL-55876. PDF (161.52 KB)
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PDF (161.52 KB). "Plasma and Ion Sources in Large Area Coatings: A Review." 2005. LBNL-57127. PDF (882.64 KB)
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PDF (882.64 KB). "Electrochromically switched, gas-reservoir metal hydride devices with application to energy-efficient windows." Thin Solid Films 1 (2008). LBNL-1089E. PDF (1.67 MB)
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PDF (1.67 MB). "Formation of Metal Oxides by Cathodic Arc Deposition." International Conference on Metallurgical Coatings and Thin Films, April 24-28, 1995. San Diego, CA, 1995. LBL-36166. PDF (807.96 KB)
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PDF (807.96 KB). "The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering." Journal of Physics D: Applied Physics 45.1 (2012) 012003.
