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Agrawal, Anoop, Hamid R Habibi, Raj K Agrawal, John P Cronin, Dale M Roberts, R'Sue Caron-Popowich, and Carl M Lampert. "Effect of Deposition Pressure on the Microstructure and Electrochromic Properties of Electron-beam-evaporated Nickel Oxide Films." Thin Solid Films 221 (1992) 239-253. LBNL-39077.
Anders, André. "Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective." 50th Technical Annual Meeting of the Society of Vacuum Coaters. 2007. LBNL-61903.
Anders, André, and Othon R Monteiro. "Surface Engineering of Glazing Materials and Structures Using Plasma Processes." Glass Processing Days 2003 . Tampere, Finland, 2003. LBNL-52436.
Anders, André, Sunnie HN Lim, Kin Man Yu, Joakim Andersson, Johanna Rosén, Mike McFarland, and Jeff Brown. "High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition." Thin Solid Films (2009). LBNL-1881E.
Anders, André, Ian G Brown, and R.G MacGill. "Vacuum-Spark Metal Ion Source Based on a Modified Marx Generator." 1996. LBNL-37922.
Anders, Simone, André Anders, Michael D Rubin, Zhien Wang, Sebastien Raoux, Fanping Kong, and Ian G Brown. "Formation of Metal Oxides by Cathodic Arc Deposition." International Conference on Metallurgical Coatings and Thin Films, April 24-28, 1995. San Diego, CA, 1995. LBL-36166.
Anders, André, and Georgy Yu Yushkov. "A low-energy linear oxygen plasma source." Review of Scientific Instruments 78.4 (2007). LBNL-62169.
Anders, André, Jiří Čapek, Matêj Hála, and Ludvik Martinu. "The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering." Journal of Physics D: Applied Physics 45.1 (2012) 012003.
Anders, André. "Plasma and Ion Sources in Large Area Coatings: A Review." 2005. LBNL-57127.
Anders, André, Joakim Andersson, David Horwat, and Arutiun P Ehiasarian. "Physics of High Power Impulse Magnetron Sputtering." ISSP2007: The 9th International Symposium on Sputtering & Plasma Processes. 2007. LBNL-62147.
Anders, André, and Simone Anders. "Working Principle of the Hollow-Anode Plasma Source." Plasma Source Science and Technology 4.4 (1995) 571-575. LBL-36240.
Anders, André, Eungsun Byon, Dong-Ho Kim, Kentaro Fukuda, and Sunnie HN Lim. "Smoothing of ultrathin silver films by transition metal seeding." Applied Physics Letters (2006). LBNL-59621.
Anders, André, Nitisak Pasaja, Sakon Sansongsiri, and Sunnie HN Lim. "Filtered cathodic arc deposition with ion-species-selective bias." Review of Scientific Instruments (2006). LBNL-61733.
Anders, André, and Jeff Brown. "A Plasma Lens for Magnetron Sputtering." IEEE Transactions on Plasma Science 39.11 (2011) 2528 - 2529.
Anders, André. "Physics of Arcing, and Implications to Sputter Deposition." Thin Solid Films (2005). LBNL-54220 .
Anders, André. "Deposition Rates of High Power Impulse Magneton Sputtering." 51st Annual Technical Meeting of the Society of Vacuum Coaters. 2008. LBNL-170E.
Anders, André. "Observation of Self-Sputtering in Energetic Condensation of Metal Ions." Applied Physics Letters 85 (2004) 6137-6139. LBNL-55876.
Anders, André, Pavel A Ni, and Joakim Andersson. "Drifting Ionization Zone in DC Magnetron Sputtering Discharges at Very Low Currents." IEEE Transactions on Plasma Science 42.10 (2014) 2578 - 2579.
Anders, André. Materials, processes, and issues in low-emissivity and solar control coatings. 2002. LBID-2452.
Anders, André. "Physics of Arcing, and Implications to Sputter Deposition." International Conference on Coatings on Glass. Saarbrucken, Germany, 2003. LBNL-54220.
Anders, André. The Periodic Table of Vacuum Arc Charge State Distributions. Berkeley, CA: Lawrence Berkeley National Laboratory, 1996. LBNL-38672.
Anders, André, Jonathan L Slack, and Thomas J Richardson. "Electrochromically switched, gas-reservoir metal hydride devices with application to energy-efficient windows." Thin Solid Films 1 (2008). LBNL-1089E.
Anders, André, Matjaž Panjan, Robert Franz, Joakim Andersson, and Pavel A Ni. "Drifting potential humps in ionization zones: The “propeller blades” of high power impulse magnetron sputtering." Applied Physics Letters 103.14 (2013) 144103.
Anders, André. "Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions." Applied Physics Letters 92.20 (2008). LBNL-171E.
Anders, André, Robert A MacGill, and Michael D Rubin. "Evaluation of the Plasma Distribution of a Quasi-Linear Constricted Plasma Source." IEEE Transactions on Plasma Science 27.1 (1999) 82-83. LBNL-42016.