Effect of Deposition Pressure on the Microstructure and Electrochromic Properties of Electron-beam-evaporated Nickel Oxide Films
Publication Type
Journal Article
Authors
Agrawal, Anoop, Hamid R Habibi, Raj K Agrawal, John P Cronin, Dale M Roberts, R'Sue Caron-Popowich, Carl M Lampert
Abstract
Electron-beam-evaporated nickel oxide films were shown to have a microcrystalline cubic nickel oxide structure. The pressure in the chamber during the film deposition has a large effect on the crystal size and the stoichiometry of the films. The redox currents, the efficiency of these films to color, and their optical properties were influenced by the processing conditions employed and the resulting microstucture. A model is proposed based on the observed microstructure that explains the source of overstoichiometric oxygen and ion transport in these films.
Journal
Thin Solid Films
Volume
221
Year of Publication
1992
Organization
Building Technologies Department, Building Technology and Urban Systems Division, Windows and Envelope Materials