Publications

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2007
Anders, André, and Georgy Yu Yushkov. "A low-energy linear oxygen plasma source." Review of Scientific Instruments 78.4 (2007). LBNL-62169.
Mohamed, Sodky H, and André Anders. "Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering." Thin Solid Films 515.13 (2007) 5264-5269. LBNL-62248.
Anders, André, Joakim Andersson, David Horwat, and Arutiun P Ehiasarian. "Physics of High Power Impulse Magnetron Sputtering." ISSP2007: The 9th International Symposium on Sputtering & Plasma Processes. 2007. LBNL-62147.
Anders, André. "Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective." 50th Technical Annual Meeting of the Society of Vacuum Coaters. 2007. LBNL-61903.
2008
Anders, André. "Deposition Rates of High Power Impulse Magneton Sputtering." 51st Annual Technical Meeting of the Society of Vacuum Coaters. 2008. LBNL-170E.
Anders, André, Jonathan L Slack, and Thomas J Richardson. "Electrochromically switched, gas-reservoir metal hydride devices with application to energy-efficient windows." Thin Solid Films 1 (2008). LBNL-1089E.
Endrino, Jose L, Jose F Marco, Phitsanu Poolcharuansin, Ayalasomayajula R Phani, Matthew Allen, José M Albella, and André Anders. "Functionalization of Hydrogen-free Diamond-like Carbon Films using Open-air Dielectric Barrier Discharge Atmospheric Plasma Treatments." Applied Surface Science 254.17 (2008). LBNL-265E.
Andersson, Joakim, and André Anders. "Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion." Applied Physics Letters 92 (2008) 221503. LBNL-190E.
Andersson, Joakim, Arutiun P Ehiasarian, and André Anders. "Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma." Applied Physics Letters 93.7 (2008) 71504. LBNL-680E.
Andersson, Joakim, and André Anders. "Self-sputtering far above the runaway threshold: an extraordinary metal ion generator." Physical Review Letters (2008). LBNL-1641E.
Anders, André. "Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions." Applied Physics Letters 92.20 (2008). LBNL-171E.
Horwat, David, and André Anders. "Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper." Journal of Physics D 41 (2008) 135210-1-6. LBNL-679E.
Field, Matthew R, Dougal G McCulloch, Sunnie HN Lim, André Anders, Vicki J Keast, and R.W. Burgess. "The structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering." Journal of Physics: Condensed Matter 20 (2008) 175216. LBNL-580E.
2010
Ni, Pavel A, and André Anders. "Supersonic metal plasma impact on a surface: an optical investigation of the pre-surface region." Journal of Physics D: Applied Physics 43.13 (2010). LBNL-2982E.

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