Publications

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Anders, André. The Periodic Table of Vacuum Arc Charge State Distributions. Berkeley, CA: Lawrence Berkeley National Laboratory, 1996. LBNL-38672.
Mohamed, Sodky H, and André Anders. "Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering." Thin Solid Films 515.13 (2007) 5264-5269. LBNL-62248.
Anders, André. "Physics of Arcing, and Implications to Sputter Deposition." International Conference on Coatings on Glass. Saarbrucken, Germany, 2003. LBNL-54220.
Anders, André. "Physics of Arcing, and Implications to Sputter Deposition." Thin Solid Films (2005). LBNL-54220 .
Anders, André, Joakim Andersson, David Horwat, and Arutiun P Ehiasarian. "Physics of High Power Impulse Magnetron Sputtering." ISSP2007: The 9th International Symposium on Sputtering & Plasma Processes. 2007. LBNL-62147.
Anders, André. "Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective." 50th Technical Annual Meeting of the Society of Vacuum Coaters. 2007. LBNL-61903.
Anders, André. "Plasma and Ion Sources in Large Area Coatings: A Review." 2005. LBNL-57127.
Anders, André, Nitisak Pasaja, Sunnie HN Lim, Tim C Petersen, and Vicki J Keast. "Plasma biasing to control the growth conditions of diamond-like carbon." Surface and Coatings Technology 201.8 (2006) 4628-4632. LBNL-59023.
Anders, André, and Jeff Brown. "A Plasma Lens for Magnetron Sputtering." IEEE Transactions on Plasma Science 39.11 (2011) 2528 - 2529.
Pelletier, Jacques, and André Anders. "Plasma-Based Ion Implantation and Deposition: A Review of Physics, Technology, and Applications." IEEE Transactions on Plasma Science 33 (2005) 1944-1959. LBNL-57610.
Anders, André, and T. Schulke. "Predicting Ion Charge State Distributions of Vacuum Arc Plasmas." 1996. LBL-37921.
Leung, Michael SH, Ralf Klockenbrink, Christian F Kisielowski, Hiroaki Fujii, Joachim Krüger, Sudhir G Subramanya, André Anders, Zuzanna Liliental-Weber, Michael D Rubin, and Eicke R Weber. "Pressure Controlled GaN MBE Growth Using a Hollow Anode Nitrogen Ion Source." Ed. Krüger, Joachim. Materials Research Society Proceedings 449.221 (1997). LBNL-39851.
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Anders, André. "Self-organization and self-limitation in high power impulse magnetron sputtering." Applied Physics Letters 100.22 (2012). LBNL-5685E.
Andersson, Joakim, and André Anders. "Self-sputtering far above the runaway threshold: an extraordinary metal ion generator." Physical Review Letters (2008). LBNL-1641E.
Anders, André. "Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions." Applied Physics Letters 92.20 (2008). LBNL-171E.
Anders, André, Eungsun Byon, Dong-Ho Kim, Kentaro Fukuda, and Sunnie HN Lim. "Smoothing of ultrathin silver films by transition metal seeding." Applied Physics Letters (2006). LBNL-59621.
Horwat, David, and André Anders. "Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper." Journal of Physics D 41 (2008) 135210-1-6. LBNL-679E.
Andersson, Joakim, Pavel A Ni, and André Anders. "Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas." Applied Physics Letters 103.5 (2013) 054104.
Mohamed, Sodky H, and André Anders. "Structural, optical and electrical properties of WOxNy films deposited by reactive dual magnetron sputtering." Surface and Coatings Technology 201.6 (2006) 2977-2983. LBNL-59900.
Field, Matthew R, Dougal G McCulloch, Sunnie HN Lim, André Anders, Vicki J Keast, and R.W. Burgess. "The structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering." Journal of Physics: Condensed Matter 20 (2008) 175216. LBNL-580E.

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