As-Sputtered Electrochromic Films of Nickel Oxide
Title | As-Sputtered Electrochromic Films of Nickel Oxide |
Publication Type | Journal Article |
Year of Publication | 1991 |
Authors | David A Wruck, M.A. Dixon, Michael D Rubin, Susan N Bogy |
Journal | Journal of Vacuum Science Technology A |
Volume | 9 |
Start Page | 2170 |
Issue | 4 |
Pagination | 2170-2173 |
Date Published | 02/1991 |
ISSN | 0734-2101 |
Keywords | absorptivity, coloration, electrochemical coating, electrochromism, hydroxyl radicals, microstructure, nickel, nickel oxides, sputtering, thin films |
Abstract | Electrochromic nickel oxide films were deposited by radio-frequency magnetron sputtering of a Ni target in gas mixtures of Ar and O2. When electrochemically cycled in 0.1 N KOH solution, large reversible changes in visible absorption were obtained within the first 10 bleach/color cycles. Films which showed the greatest changes in optical properties and charge capacity were produced within a narrow range of oxygen flow rates. The coloration efficiency was found to be insensitive to the sputtering conditions and stoichiometry, with a value of 34+-4 cm2C-1 at 550 nm. This indicates that microstructure and charge capacity determine the absorption coefficient. The reaction rate was found to depend on the concentration of OH- in the electrolyte, indicating that OH- diffusion in the electrolyte limits the rate of reaction. |
DOI | 10.1116/1.577245 |
LBNL Report Number | LBL-30066 |
Short Title | J. Vac. Sci. Technol. A |