The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering

TitleThe ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering
Publication TypeJournal Article
Year of Publication2011
AuthorsAndré Anders, Jiří Čapek, Matêj Hála, Ludvik Martinu
JournalJournal of Physics D: Applied Physics
Volume45
Issue1
Pagination012003
Date Published01/2012
ISSN0022-3727
Abstract

Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway.

DOI10.1088/0022-3727/45/1/012003
Short TitleJ. Phys. D: Appl. Phys.