Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering

TitlePhysical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering
Publication TypeJournal Article
Year of Publication2007
AuthorsSodky H. Mohamed, André Anders
JournalThin Solid Films
Volume515
5264
Issue13
Pagination5264-5269
Date Published05/2007
KeywordsDual magnetron sputtering, electrical resistivity, Er ion implantation, optical properties, tungsten oxide films
Abstract

Amorphous and partially crystalline WO3 thin films were prepared by reactive dual magnetron sputtering and successively implanted by erbium ions with a fluence in the range from 7.7 x 1014 to 5 x 1015 ions/cm2. The electrical and optical properties were studied as a function of the film deposition parameters and the ion fluence. Ion implantation caused a strong decrease of the resistivity, a moderate decrease of the index of refraction and a moderate increase of the extinction coefficient in the visible and near infrared, while the optical band gap remained almost unchanged. These effects could be largely ascribed to ion-induced oxygen deficiency. When annealed in air, the already low resistivities of the implanted samples decreased further up to 70°C, whereas oxidation, and hence a strong increase of the resistivity, was observed at higher annealing temperatures

DOI10.1016/j.tsf.2006.12.179
LBNL Report Number

LBNL-62248