Effect of Deposition Pressure on the Microstructure and Electrochromic Properties of Electron-beam-evaporated Nickel Oxide Films

TitleEffect of Deposition Pressure on the Microstructure and Electrochromic Properties of Electron-beam-evaporated Nickel Oxide Films
Publication TypeJournal Article
Year of Publication1992
AuthorsAnoop Agrawal, Hamid R Habibi, Raj K Agrawal, John P Cronin, Dale M Roberts, R'Sue Caron-Popowich, Carl M Lampert
JournalThin Solid Films
Volume221
Pagination239-253
Call NumberLBNL-39077
Abstract

Electron-beam-evaporated nickel oxide films were shown to have a microcrystalline cubic nickel oxide structure. The pressure in the chamber during the film deposition has a large effect on the crystal size and the stoichiometry of the films. The redox currents, the efficiency of these films to color, and their optical properties were influenced by the processing conditions employed and the resulting microstucture. A model is proposed based on the observed microstructure that explains the source of overstoichiometric oxygen and ion transport in these films.

LBNL Report Number

LBNL-39077