Pulsed Plasma Processing
Downloadable: Invited Talk "Pulsed
Metal Plasmas," presented at the 2006 AVS Meeting, San Francisco,
California, November 15, 2006. (PDF, file size 8 MB).
Plasma Sources for Window Coatings
processes for low-emittance and solar control coatings can be improved through the use of
advanced plasma technology developed at LBNL. A new type of constricted glow-discharge
plasma source was selected for the 1997 R&D 100 Award. Invented by LBNL researchers
Andre Anders, Mike Rubin, and Mike Dickinson, the source was designed to be compatible
with industrial vacuum deposition equipment and practice. Construction is simple, rugged
and inexpensive. It can operate indefinitely over a wide range of chamber pressure without
any consumable parts such as filaments or grids. Several different gases including Argon,
Oxygen and Nitrogen have been tested successfully.
Principle of the Hollow-Anode Plasma Source
of a low-energy constricted-plasma source
Among the potential uses of the source are densification of coatings for greater
durability, crystallization at low temperatures for increased reflectivity or electrical
conductivity, enhancement of reactivity to produce an otherwise unstable phase or increase
deposition rate, and control over composition. Several of these sources have been
fabricated for specific uses by glazing manufacturers. LBNL will assist these
manufacturers to optimize the source characteristics and to develop new coating types.
Recently, a linear configuration was successfully tested. Consisting of an array of
miniaturized versions of the original source this linear source is extendible to a
deposition system of any width.
The operation of the source is described in more detail in the following papers:
For more information about this subject contact Andre