Pulsed Plasma Processing

NEW:

Downloadable: Invited Talk "Pulsed Metal Plasmas," presented at the 2006 AVS Meeting, San Francisco, California, November 15, 2006.  (PDF, file size 8 MB).



Plasma Sources for Window Coatings

 

Deposition processes for low-emittance and solar control coatings can be improved through the use of advanced plasma technology developed at LBNL. A new type of constricted glow-discharge plasma source was selected for the 1997 R&D 100 Award. Invented by LBNL researchers Andre Anders, Mike Rubin, and Mike Dickinson, the source was designed to be compatible with industrial vacuum deposition equipment and practice. Construction is simple, rugged and inexpensive. It can operate indefinitely over a wide range of chamber pressure without any consumable parts such as filaments or grids. Several different gases including Argon, Oxygen and Nitrogen have been tested successfully. 

  
Among the potential uses of the source are densification of coatings for greater durability, crystallization at low temperatures for increased reflectivity or electrical conductivity, enhancement of reactivity to produce an otherwise unstable phase or increase deposition rate, and control over composition. Several of these sources have been fabricated for specific uses by glazing manufacturers. LBNL will assist these manufacturers to optimize the source characteristics and to develop new coating types. Recently, a linear configuration was successfully tested. Consisting of an array of miniaturized versions of the original source this linear source is extendible to a deposition system of any width. 
 
 The operation of the source is described in more detail in the following papers:

Working Principle of the Hollow-Anode Plasma Source

Characterization of a low-energy constricted-plasma source

For more information about this subject contact Andre Anders